logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12772763 B1

PDFFull Text
Date of Patent:
Oct. 20, 2026

Filed:

Apr. 13, 2023

Deposition of flowable sicn films by plasma enhanced atomic layer deposition

Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Shinya Yoshimoto, Tama, JP;

Jhoelle Roche Guhit, Tama, JP;

Makoto Igarashi, Fuchu, JP;

Hideaki Fukuda, Hachioji, JP;

Aurelie Kuroda, Chofu, JP;

Timothee Blanquart, Oud-Heverlee, BE;

Takahiro Onuma, Chofu, JP;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:

Snell & Wilmer L.L.P.

Primary Examiner:

Kelly M Gambetta

Int. Cl.
CPC ...
H10P 14/69 (2026.01); C23C 16/36 (2006.01); C23C 16/455 (2006.01); C23C 16/48 (2006.01); C23C 16/52 (2006.01); H10P 14/60 (2026.01);
U.S. Cl.
CPC ...
H10P 14/6905 (2026.01); C23C 16/36 (2013.01); C23C 16/4554 (2013.01); C23C 16/482 (2013.01); C23C 16/52 (2013.01); H10P 14/6339 (2026.01); H10P 14/6532 (2026.01); H10P 14/6538 (2026.01); H10P 14/6689 (2026.01);
Abstract

In accordance with some embodiments herein, methods and apparatuses for flowable deposition of thin films are described. Some embodiments relate to cyclical processors for gap-fill in which deposition is followed by a thermal anneal and ultraviolet treatment and repeated. In some embodiments, the deposition, thermal anneal, and ultraviolet treatment are carried out in separate stations. In some embodiments, a second station is heated to a higher temperature than a first station. In some embodiments, a separate module is used for curing.

Find Patent Forward Citations

Yoshimoto, Shinya. (2026). Deposition of flowable sicn films by plasma enhanced atomic layer deposition (U.S. Patent No. 12772763). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772763

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…