The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Jun. 13, 2023
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Shishir Pandya, Hillsboro, OR (US);

James Kally, Hillsboro, OR (US);

Robert Ehlert, Portland, OR (US);

Anand S. Murthy, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/13 (2025.01); H10D 30/01 (2025.01); H10D 30/43 (2025.01); H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 64/01 (2025.01);
U.S. Cl.
CPC ...
H10D 62/151 (2025.01); H10D 30/014 (2025.01); H10D 30/43 (2025.01); H10D 30/6735 (2025.01); H10D 62/121 (2025.01); H10D 64/017 (2025.01); H10D 64/018 (2025.01);
Abstract

Described herein are nanoribbon transistors with a uniform layer of silicon material epitaxially deposited on the ends of the channel regions for the source and drain regions. The silicon is deposited over both the nanoribbon ends and dimple spacers between adjacent nanoribbons. The material may be deposited using a multicycle deposition and etch process, in which both crystalline and amorphous silicon are deposited in a low-selectivity process, and amorphous silicon is removed between deposition steps.


Find Patent Forward Citations

Pandya, Shishir. (2026). Nanoribbon transistor source and drain with uniform nucleation (U.S. Patent No. 12772518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772518

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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