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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12770835 B1

PDFFull Text
Date of Patent:
Oct. 20, 2026

Filed:

Sep. 29, 2022

Coated part for plasma processing chamber

Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Lin Xu, Fremont, CA (US);

Satish Srinivasan, Newark, CA (US);

David Joseph Wetzel, Santa Clara, CA (US);

Scott Briggs, Menlo Park, CA (US);

Andrew D. Bailey, III, Milpitas, CA (US);

Yiwei Song, San Jose, CA (US);

Michael Julius Kinsler, San Jose, CA (US);

John Michael Kerns, Livermore, CA (US);

Lei Liu, Fremont, CA (US);

Robin Koshy, Fremont, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:

Beyer Law Group LLP

Primary Examiner:

Christopher M Raabe

Int. Cl.
CPC ...
H01J 9/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32559 (2013.01); H01J 9/02 (2013.01); H01J 37/32091 (2013.01); H01J 37/3255 (2013.01); H01J 2209/012 (2013.01); H01J 2237/0213 (2013.01);
Abstract

An apparatus for processing a substrate is provided. A capacitively coupled plasma electrode is within a capacitively coupled plasma processing chamber. A plasma confinement component is within the capacitively coupled plasma processing chamber, wherein at least one of the capacitively coupled plasma electrode and plasma confinement component comprises a metal component body with a plasma facing surface and a plasma spray coating over the plasma facing surface.

Find Patent Forward Citations

Xu, Lin. (2026). Coated part for plasma processing chamber (U.S. Patent No. 12770835). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12770835

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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