The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Jul. 18, 2024
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Nuo Xu, San Jose, CA (US);
Zhengping Jiang, Hsinchu, TW;
Ji-Ting Li, Hsinchu, TW;
Yuan Hao Chang, Hsinchu, TW;
Zhiqiang Wu, Hsinchu County, TW;
Wen-Hsing Hsieh, Hsinchu City, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
The present disclosure provides a method for topography simulation of a physical structure under a topography-changing process. The method includes initializing a voxel mesh as a three-dimensional (3D) representation of a physical structure by a central processing unit (CPU), generating a batch of particles, simulating a flight path of one of the particles with a ray-tracing method by a parallel processing thread in a graphics processing unit (GPU), identifying a surface normal of a voxel unit in the voxel mesh that intersects the flight path by the parallel processing thread in the GPU, passing parameters describing the one of the particles hitting the voxel mesh from the GPU to the CPU, determining a surface reaction between the one of the particles and the voxel unit by the CPU, and updating the voxel mesh based on the determining of the surface reaction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile