Yuan Hao Chang

Title: Innovations of Yuan Hao Chang

Introduction

Yuan Hao Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his expertise and innovative spirit. His work focuses on topography simulation processes that are crucial for advancements in semiconductor manufacturing.

Latest Patents

Yuan Hao Chang's latest patents include a method for semiconductor topography simulation of non-removal type processes. This patent provides a comprehensive method for simulating the topography of a physical structure during a topography-changing process. The method involves initializing a voxel mesh as a three-dimensional representation of the physical structure, generating a batch of particles, and simulating their flight paths using a ray-tracing method. It also includes identifying voxel units that intersect with the flight paths and determining surface reactions to enhance the simulation accuracy.

Another significant patent by Chang is a system and method for semiconductor topography simulations. This innovation also focuses on simulating the topography of a physical structure under changing processes. It utilizes a parallel processing thread in a hardware accelerator to simulate particle flight paths and identify surface normals of voxel units. The method further involves determining surface reactions through a central processing unit and updating the voxel mesh accordingly.

Career Highlights

Yuan Hao Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves applying his innovative methods to improve semiconductor manufacturing processes. His contributions have been instrumental in enhancing the efficiency and accuracy of topography simulations.

Collaborations

Yuan Hao Chang has collaborated with notable colleagues such as Zhengping Jiang and Nuo Xu. Their combined expertise has fostered advancements in semiconductor technology and has contributed to the successful development of innovative solutions in the field.

Conclusion

Yuan Hao Chang is a distinguished inventor whose work in semiconductor topography simulation has made a significant impact on the industry. His patents reflect his commitment to innovation and excellence in technology. His contributions continue to shape the future of semiconductor manufacturing.