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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12755937 B1

PDFFull Text
Date of Patent:
Oct. 06, 2026

Filed:

Dec. 27, 2024

Plasma processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Nozomu Nagashima, Miyagi, JP;

Daisuke Yoshikoshi, Miyagi, JP;

Kunihiko Yamagata, Miyagi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

XSENSUS LLP

Primary Examiner:

Alexander H Taningco

Assistant Examiner:

Pedro C Fernandez

Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H01J 37/32091 (2013.01); H01J 37/3211 (2013.01); H01J 37/32146 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01); H01J 2237/334 (2013.01);
Abstract

Provided is a plasma processing apparatus comprising: a plasma processing chamber; a substrate support; a high frequency power supply; an electrode or an antenna electrically connected to the high frequency power supply; a power consuming member disposed within the plasma processing chamber or the substrate support; an electricity storage unit electrically connected to the power consuming member; a power transmitting coil provided outside the plasma processing chamber; a power receiving coil electrically connected to the electricity storage unit and capable of receiving power from the power transmitting coil; at least one metal case that provides a shielded space and accommodates the power transmitting coil and the power receiving coil within the shielded space; and at least one ferrite material that is disposed within the shielded space and is provided to close a space in which the power transmitting coil and the power receiving coil are disposed.

Find Patent Forward Citations

Nagashima, Nozomu. (2026). Plasma processing apparatus (U.S. Patent No. 12755937). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12755937

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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