The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Feb. 21, 2024
Applied Materials Israel Ltd., Rehovot, IL;
Bar Dubovski, Beit Hashmonay, IL;
Ran Yacoby, Jerusalem, IL;
Tung-Yuan Hsieh, Tainan City, TW;
Kevin Ryan Houchens, Rehovot, IL;
Tal Itzkovich, Tel-Aviv, IL;
Nahum Bomshtein, Modi'in-Maccabim-Re'ut, IL;
Jenny Perry, Rehovot, IL;
Boris Levant, Rehovot, IL;
Applied Materials Israel Ltd., Rehovot, IL;
Abstract
There are provided systems and methods comprising, for each given overlay target of a plurality of different overlay targets to be manufactured on a semiconductor specimen, said given overlay target comprising a plurality of stacked semiconductor layers, obtaining a design image of the given overlay target, feeding the design image to a trained machine learning model, to simulate at least one image of the given overlay target that would have been acquired by an electron beam examination system, using the at least one image to determine, before actual manufacturing of the given overlay target, data informative of at least one simulated overlay in the image, and using the data informative of the at least one simulated overlay of each given overlay target to select at least one optimal overlay target among the plurality of different overlay targets, the optimal overlay target being usable to be manufactured on the semiconductor specimen.