The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Sep. 09, 2022
Jiangsu Leuven Instruments Co., Ltd., Xuzhou, CN;
Huaidong Zhang, Xuzhou, CN;
Yaoyao Zhang, Xuzhou, CN;
Dongdong Hu, Xuzhou, CN;
Chaoquan Yang, Xuzhou, CN;
Shiran Cheng, Xuzhou, CN;
Xiang Yu, Xuzhou, CN;
Xiaoli Shi, Xuzhou, CN;
Kaidong Xu, Xuzhou, CN;
JIANGSU LEUVEN INSTRUMENTS CO., LTD., Xuzhou, CN;
Abstract
An ion beam etching machine and a lower electrode structure thereof. The lower electrode structure comprises an electrode plate, a ring pressing mechanism, and a lifting mechanism, the ring pressing mechanism being configured to support a member to be etched, and the lifting mechanism being configured to drive the ring pressing mechanism to ascend and descend relative to the electrode plate; and same further comprises a position measurement mechanism for measuring a position to which the ring pressing mechanism descends relative to the electrode plate. The lifting mechanism is configured to stop driving the ring pressing mechanism to descend based on measurement information fed back by the position measurement mechanism. The arrangement of the lower electrode structure can avoid fragmenting of the member to be etched, and improve the product yield.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile