The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Jun. 14, 2023
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Tsung-Sheng Kang, Ballston Lake, NY (US);

Tao Li, Slingerlands, NY (US);

Ruilong Xie, Niskayuna, NY (US);

Eric Miller, Albany, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 84/83 (2025.01); H10D 30/00 (2025.01); H10D 30/01 (2025.01); H10D 64/01 (2025.01); H10D 64/23 (2025.01); H10D 84/01 (2026.01); H10W 20/00 (2026.01); H10W 20/41 (2026.01);
U.S. Cl.
CPC ...
H10D 84/8312 (2025.01); H10D 30/0198 (2025.01); H10D 30/501 (2025.01); H10D 64/017 (2025.01); H10D 64/2565 (2025.01); H10D 84/0133 (2025.01); H10D 84/0149 (2025.01); H10D 84/0151 (2025.01); H10D 84/83125 (2025.01); H10D 84/832 (2025.01); H10W 20/069 (2026.01); H10W 20/427 (2026.01);
Abstract

A semiconductor structure includes a plurality of gate-all-around field effect transistors. Each of the gate-all-around field effect transistors includes first and second source-drain regions; at least one channel region interconnecting the first and second source-drain regions; and a gate structure surrounding the at least one channel region. A direct backside contact is located below one of the first and second source-drain regions. The direct backside contact has an upper portion. A dielectric liner is wrapped around the upper portion of the direct backside contact.


Find Patent Forward Citations

Kang, Tsung-Sheng. (2026). Placeholder with dielectric liner protection to prevent direct backside contact (dbc) from shorting to gate (U.S. Patent No. 12720853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12720853

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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