The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Sep. 27, 2022
Applicant:

Byd Semiconductor Company Limited, Shenzhen, CN;

Inventors:

Hui Zhu, Shenzhen, CN;

Baowei Huang, Shenzhen, CN;

Xiuguang Xiao, Shenzhen, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/13 (2025.01); H10D 12/00 (2025.01); H10D 12/01 (2025.01); H10D 62/10 (2025.01); H10D 62/17 (2025.01); H10P 30/20 (2026.01);
U.S. Cl.
CPC ...
H10D 62/142 (2025.01); H10D 12/032 (2025.01); H10D 12/441 (2025.01); H10D 12/481 (2025.01); H10D 62/112 (2025.01); H10D 62/393 (2025.01); H10P 30/204 (2026.01); H10P 30/21 (2026.01);
Abstract

An insulated gate bipolar transistor and a preparation method thereof, and an electronic device. The insulated gate bipolar transistor includes: a drift region; an electrode structure on one side of the drift region; and an electric field stop layer arranged on one side of the drift region away from the electrode structure. The electric field stop layer includes a first sublayer and a second sublayer laminated together. The first sublayer is arranged close to the drift region. A junction depth of the first sublayer is greater than a junction depth of the second sublayer. A peak value of a doping concentration of the first sublayer is less than a peak value of a doping concentration of the second sublayer. A slope of a doping concentration curve of the first sublayer is less than a slope of a doping concentration curve of the second sublayer.


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