The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Oct. 16, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Jia-Lin Syu, Hsinchu, TW;

Tai-Yu Chen, Hsinchu, TW;

Yi-Zhen Chen, Hsinchu, TW;

Yen-Hsun Chen, Hsinchu, TW;

Shang-Chieh Chien, Hsinchu, TW;

Li-Jui Chen, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/84 (2012.01); G01N 21/88 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G03F 1/84 (2013.01); G01N 21/8851 (2013.01); G01N 21/95607 (2013.01); G01N 2021/8883 (2013.01); G01N 2021/95615 (2013.01); G01N 2021/95676 (2013.01);
Abstract

A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.


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