The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Oct. 28, 2022
Applicant:

Murata Manufacturing Co., Ltd., Kyoto, JP;

Inventors:

Shishir Ray, San Diego, CA (US);

Anil Kumar, San Diego, CA (US);

Sinan Goktepeli, Austin, TX (US);

Kouassi Sebastien Kouassi, San Diego, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); G11C 11/408 (2006.01); G11C 11/412 (2006.01); G11C 11/418 (2006.01); H01L 21/768 (2006.01); H01L 23/48 (2006.01); H01L 25/00 (2006.01); H01L 25/065 (2023.01); H10B 41/27 (2023.01); H10B 41/30 (2023.01); H10B 41/35 (2023.01); H10B 43/30 (2023.01); H10B 43/35 (2023.01); H10D 1/00 (2025.01); H10D 1/68 (2025.01); H10D 30/01 (2025.01); H10D 30/67 (2025.01); H10D 64/27 (2025.01); H10W 72/00 (2026.01); H10W 80/00 (2026.01); H10W 90/00 (2026.01);
U.S. Cl.
CPC ...
H10W 90/00 (2026.01); H10D 1/042 (2025.01); H10D 1/714 (2025.01); H10D 1/716 (2025.01); H10W 72/07232 (2026.01); H10W 80/312 (2026.01); H10W 80/327 (2026.01); H10W 90/728 (2026.01); H10W 90/798 (2026.01);
Abstract

Single-chip solutions and related methods that result in much higher capacitance densities than is achievable with current on-chip solutions and which reduce consumption of planar area of a mounting structure. Embodiments of the present invention use vertical stacking to affix one or more discrete embeddable capacitors to an IC chip superstructure or base structure, and either sequentially or concurrently form electrical connections between the discrete embeddable capacitors and the IC chip. The inventive processes are compatible with CMOS fabrication temperatures for the IC chip while allowing use of capacitors that are fabricated using other processes that may involve much higher temperatures. The inventive processes allow connection of relatively large capacitances (e.g., ˜0.5 μF-1 μF) to an IC chip without increasing the 2-D footprint of the IC chip. Some embodiments include reconfigurable discrete/affixed capacitors and/or discrete/affixed capacitors with through-vias (distinct from capacitor electrode connections) for connecting circuitry.


Find Patent Forward Citations

Loading…