The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Apr. 11, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Chansoo Kang, Suwon-si, KR;
Daewon Kang, Suwon-si, KR;
Minju Kim, Suwon-si, KR;
Tae-Hyun Kim, Suwon-si, KR;
Sang Ki Nam, Suwon-si, KR;
Dougyong Sung, Suwon-si, KR;
Jungmo Yang, Suwon-si, KR;
Sejin Oh, Suwon-si, KR;
Keonhee Lim, Suwon-si, KR;
Junho Im, Suwon-si, KR;
Samsung Electronics Co. Ltd., Suwon-si, KR;
Abstract
A substrate processing apparatus includes a process chamber providing a process space, a stage located in the process chamber and configured to support a substrate, a window coupled to a side of the process chamber, and a scintillator layer coupled to one side surface of the window. The scintillator layer covers a portion of the one side surface of the window which is less than the full window surface. A second surface corresponding to another portion of the one side surface of the window is exposed. Light emitted by a plasma in the process space passes through the window and is collected by an optical system and analyzed. Ultraviolet light passing through the scintillator is converted to longer wavelength, generally visible, light. Comparing the light passing through the bare window with the light passing through the scintillator layer enables analysis of the plasma.