The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Dec. 19, 2023
Applicant:
Toppan Inc., Tokyo, JP;
Inventors:
Ryota Tanaka, Tokyo, JP;
Haruka Omori, Tokyo, JP;
Kenta Osawa, Tokyo, JP;
Kenji Matsuhisa, Tokyo, JP;
Assignee:
TOPPAN INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/08 (2006.01); B32B 7/12 (2006.01); B32B 27/32 (2006.01); B32B 33/00 (2006.01);
U.S. Cl.
CPC ...
B32B 27/08 (2013.01); B32B 7/12 (2013.01); B32B 27/32 (2013.01); B32B 33/00 (2013.01); B32B 2250/02 (2013.01); B32B 2307/31 (2013.01); B32B 2307/42 (2013.01); B32B 2307/7242 (2013.01); B32B 2553/00 (2013.01);
Abstract
A gas barrier film includes a base material containing a polyethylene as a main resin component and an inorganic oxide layer formed on a first surface side of the base material. The birefringence ΔN of the first surface calculated based on measurement by a parallel Nicol rotation method is 0 or more and 0.007 or less, and the proportion of the polyethylene in the entire gas barrier film is 90 mass % or more.