Company Filing History:
Years Active: 2024-2025
Title: Kenta Osawa: Innovator in Gas Barrier Film Technology
Introduction
Kenta Osawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of gas barrier films. With a total of 2 patents to his name, Osawa's work is recognized for its innovative approach and practical applications.
Latest Patents
Osawa's latest patents include a gas barrier film that features a substrate primarily composed of polypropylene. This film incorporates a gas barrier layer on its first surface, along with a coating layer on top of the gas barrier layer. Notably, infrared spectroscopy of the first surface reveals specific peak intensities that adhere to a defined ratio, enhancing the film's effectiveness. Another patent focuses on a gas barrier film and its production method, which utilizes a substrate made mainly of polyethylene or polypropylene. This film also includes a gas barrier layer and a cover layer, with a critical element ratio of oxygen to carbon on the substrate's surface.
Career Highlights
Kenta Osawa is associated with Toppan Inc., a company known for its advancements in printing and packaging technologies. His work at Toppan has allowed him to explore innovative solutions in material applications, particularly in enhancing the performance of gas barrier films.
Collaborations
Osawa collaborates with talented colleagues, including Yuki Hayashi and Junpei Hayashi. Their combined expertise contributes to the ongoing development of cutting-edge technologies in their field.
Conclusion
Kenta Osawa's contributions to gas barrier film technology exemplify his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to creating effective solutions that meet industry needs.