The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Jun. 14, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Wenjie Jin, Eindhoven, NL;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Nan Lin, Eindhoven, NL;
Christina Lynn Porter, Veldhoven, NL;
David O'dwyer, Eindhoven, NL;
Cord Louis Arnold, Rydebäck, SE;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Assignee:
ASML Netherlands B. V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02001 (2022.01); G03F 7/00 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02001 (2013.01); G03F 7/70008 (2013.01); G03F 7/70641 (2013.01); H05G 2/0027 (2024.08);
Abstract
Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiation at an interaction region of the gas target, and an interferometer for illuminating at least part of the gas target with an interferometer radiation to measure a property of the gas target.