The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Aug. 12, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Nobuo Matsuki, Nirasaki, JP;
Yoshinori Morisada, Nirasaki, JP;
Takayuki Komiya, Nirasaki, JP;
Satoru Kawakami, Nirasaki, JP;
Taro Ikeda, Nirasaki, JP;
Toshihiko Iwao, Austin, TX (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/345 (2013.01); C23C 16/45529 (2013.01); C23C 16/4554 (2013.01); C23C 16/509 (2013.01); C23C 16/52 (2013.01);
Abstract
A film forming method forms a film on a substrate by plasma in a processing container including a stage configured to hold the substrate thereon, wherein the film forming method includes: (a) a step of supplying a raw material gas and a reaction gas as a processing gas to the processing container; and (b) a step of generating plasma of the processing gas using a radio-frequency power of 100 MHz or higher.