The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Sep. 25, 2018
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Zhong-Wei Chen, San Jose, CA (US);

Jack Jau, Los Altos Hills, CA (US);

Wei Fang, Milpitas, CA (US);

Chiyan Kuan, Danville, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01L 21/67288 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2817 (2013.01);
Abstract

Disclosed herein is a method comprising: determining parameters of a recipe of charged particle beam inspection of a region on a sample, based on a second set of characteristics of the sample; inspecting the region using the recipe.


Find Patent Forward Citations

Chen, Zhong-Wei. (2026). Dynamic determination of a sample inspection recipe of charged particle beam inspection (U.S. Patent No. 12620549). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12620549

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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