The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Dec. 30, 2022
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventors:

Hongbin Zhu, Wuhan, CN;

Weihua Cheng, Wuhan, CN;

Wei Liu, Wuhan, CN;

Wenyu Hua, Wuhan, CN;

Bingjie Yan, Wuhan, CN;

Zichen Liu, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); H10B 53/30 (2023.01); H10B 63/00 (2023.01); H10B 63/10 (2023.01);
U.S. Cl.
CPC ...
H10B 12/315 (2023.02); H10B 12/05 (2023.02); H10B 53/30 (2023.02); H10B 63/10 (2023.02); H10B 63/34 (2023.02);
Abstract

In certain aspects, a semiconductor device includes a vertical transistor, a metal bit line, and a pad layer. The vertical transistor includes a semiconductor body extending in a first direction, and a gate structure coupled to at least one side of the semiconductor body. The gate structure includes a gate dielectric and a gate electrode. The metal bit line extends in a second direction perpendicular to the first direction and coupled to a terminal of the vertical transistor via an ohmic contact. The pad layer is positioned between the gate electrode and the metal bit line in the first direction. The gate dielectric and the pad layer have different dielectric materials.


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