The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Nov. 01, 2022
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masahiro Fukushima, Joetsu, JP;
Shun Kikuchi, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/029 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/029 (2013.01); G03F 7/0048 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01);
Abstract
A molecular resist composition comprising a sulfonium salt having formula (1) or (2) and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography.