The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Oct. 01, 2020
Asml Netherlands B.v., Veldhoven, NL;
Qiang Zhang, Campbell, CA (US);
Yunbo Guo, San Jose, CA (US);
Yu Cao, Saratoga, CA (US);
Jen-Shiang Wang, Sunnyvale, CA (US);
Yen-Wen Lu, Saratoga, CA (US);
Danwu Chen, Guangdong, CN;
Pengcheng Yang, Guangdong, CN;
Haoyi Liang, San Jose, CA (US);
Zhichao Chen, San Jose, CA (US);
Lingling Pu, San Jose, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for training a machine learning model to generate a predicted measured image, the method including obtaining (a) an input target image associated with a reference design pattern, and (b) a reference measured image associated with a specified design pattern printed on a substrate, wherein the input target image and the reference measured image are non-aligned images; and training, by a hardware computer system and using the input target image, the machine learning model to generate a predicted measured image.