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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12525437 B1

PDFFull Text
Date of Patent:
Jan. 13, 2026

Filed:

Sep. 15, 2022

Substrate bombardment with ions having targeted mass using pulsed bias phase control

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Sergey Voronin, Albany, NY (US);

Qi Wang, Albany, NY (US);

Hamed Hajibabaeinajafabadi, Albany, NY (US);

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Joshua L Allen

Assistant Examiner:

Andrew Keelan Laobak

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32422 (2013.01); H01J 37/32211 (2013.01); H01L 21/3065 (2013.01); H01J 37/32935 (2013.01); H01J 2237/334 (2013.01);
Abstract

A method of plasma processing includes generating plasma by coupling a source power pulse to a plasma processing chamber containing a substrate holder configured to support a substrate. The plasma includes first ions having a first mass and second ions having a second mass greater than the first mass. The ion density ratio of the second ions to the first ions is a first ratio. The method further includes delivering an energetic ion flux of second ions to the substrate by applying a delayed bias power pulse to the substrate holder after a delay between the source power pulse and the delayed bias power pulse. The delay is chosen based on the diffusion time constants of the first ions and the second ions so that the ion density ratio of the second ions to the first ions is a second ratio that is greater than the first ratio.

Find Patent Forward Citations

Voronin, Sergey. (2026). Substrate bombardment with ions having targeted mass using pulsed bias phase control (U.S. Patent No. 12525437). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12525437

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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