The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Jul. 06, 2022
Applicant:
Globalfoundries Singapore Pte. Ltd., Singapore, SG;
Inventors:
Hung Chang Liao, Singapore, SG;
Shiang Yang Ong, Singapore, SG;
Jianbo Zhou, Singapore, SG;
Zhongxiu Yang, Singapore, SG;
Sivakami Subramanian, Singapore, SG;
Assignee:
GLOBALFOUNDRIES Singapore Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 21/763 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76224 (2013.01); H01L 21/763 (2013.01);
Abstract
A trench isolation structure and method of making the same is provided. The trench isolation structure comprises a trench in a substrate, the trench having a bottom surface and sidewalls. A polycrystalline material is at least partially in the trench and an amorphous layer is over the polycrystalline material.