The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Feb. 17, 2023
Applicant:

United Microelectronics Corp., Hsinchu, TW;

Inventors:

Huan Chi Ma, Tainan, TW;

Kuan-Ting Lin, New Taipei, TW;

Ying Jie Huang, Changhua County, TW;

Chien-Wen Yu, Kaohsiung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/01 (2025.01); H01L 21/225 (2006.01); H01L 21/311 (2006.01); H10D 30/47 (2025.01); H10D 62/17 (2025.01); H10D 62/85 (2025.01); H10D 62/854 (2025.01);
U.S. Cl.
CPC ...
H10D 30/015 (2025.01); H01L 21/2258 (2013.01); H01L 21/31116 (2013.01); H10D 30/475 (2025.01); H10D 62/221 (2025.01); H10D 62/854 (2025.01); H10D 62/8503 (2025.01);
Abstract

Provided is a semiconductor device including an enhancement mode (E-mode) high electron mobility transistor (HEMT). The E-mode HEMT includes a substrate, and a channel layer disposed on the substrate. A barrier structure disposed on the channel layer. A pair of source/drain (S/D) metals respectively disposed on the channel layer at opposite sides of the barrier structure. A gate metal disposed on the barrier structure between the pair of S/D metals. The channel layer has a two-dimensional electron gas (2DEG) layer close to an interface between the channel layer and the barrier structure. A fluorine ion concentration in the channel layer adjacent to the 2DEG layer is greater than that away from the 2DEG layer.


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