The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Feb. 25, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jian Zhang, San Jose, CA (US);
Yan Wang, San Jose, CA (US);
Liang Tang, San Jose, CA (US);
Yixiang Wang, Fremont, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); G01B 11/06 (2006.01); H01J 37/21 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G01B 11/0608 (2013.01); H01J 37/21 (2013.01); H01J 37/222 (2013.01); H01J 37/244 (2013.01); H01J 2237/20292 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/2482 (2013.01); H01J 2237/2817 (2013.01);
Abstract
An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.