The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Dec. 13, 2021
Mattson Technology, Inc., Fremont, CA (US);
Beijing E-town Semiconductor Technology Co., Ltd., Beijing, CN;
Michael Yang, Palo Alto, CA (US);
Yun Yang, Berwyn, PA (US);
Manuel Sohn, Ulm, DE;
Silke Hamm, Laupheim, DE;
Alex Wansidler, Blaustein, DE;
Dieter Hezler, Lonsee-Halzhausen, DE;
Rolf Bremensdorfer, Bibertal, DE;
Beijing E-Town Semiconductor Technology Co., Ltd, Beijing, CN;
Mattson Technology, Inc., Fremont, CA;
Abstract
A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a gas delivery system, and radiative heat sources for heating the workpiece. The gas delivery system includes a gas showerhead assembly that is transparent to electromagnetic radiation emitted from the one or more radiative heat sources. The gas showerhead assembly includes one or more gas diffusion mechanisms to distribute gas within the enclosure.