The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Aug. 31, 2022
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruilong Xie, Niskayuna, NY (US);

Chun-Chen Yeh, Danbury, CT (US);

Alexander Reznicek, Troy, NY (US);

Kangguo Cheng, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/63 (2025.01); H10D 30/01 (2025.01); H10D 62/13 (2025.01); H10D 64/01 (2025.01);
U.S. Cl.
CPC ...
H10D 30/63 (2025.01); H10D 30/025 (2025.01); H10D 62/151 (2025.01); H10D 64/018 (2025.01);
Abstract

A semiconductor device includes: a vertical transport field-effect transistor (VTFET) device including a bottom source/drain (S/D) epitaxial layer, a vertical fin channel formed on the bottom S/D epitaxial layer, and a top S/D epitaxial layer formed on the vertical fin channel. The bottom S/D epitaxial layer has an asymmetric profile in cross-section where a first side of the vertical fin channel is aligned with a first side of the bottom S/D epitaxial layer, and the bottom S/D epitaxial layer has a stepped profile that extends beyond a second edge of the vertical fin channel.


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