The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Nov. 09, 2023
Xi'an Jiaotong University, Xi'an, CN;
Jian Wu, Xi'an, CN;
Zhiyuan Jiang, Xi'an, CN;
Ziwei Chen, Xi'an, CN;
Zhenyu Wang, Xi'an, CN;
Wei Wang, Xi'an, CN;
Xinmiao Zhou, Xi'an, CN;
Huantong Shi, Xi'an, CN;
Xingwen Li, Xi'an, CN;
XI'AN JIAOTONG UNIVERSITY, Xi'an, CN;
Abstract
The present disclosure discloses an optical measurement device and method for a plasma magnetic field with adjustable sensitivity. The method comprises the following steps: constructing an optical rotation measurement system based on a pulsed laser beam for measuring an optical rotation image and a shadow image; processing the optical rotation image and the shadow image, and obtaining a distribution of proportional coefficients based on alight intensity distribution; obtaining a distribution of rotation angles based on a mapping relationship between the proportional coefficients and the rotation angles; constructing an interference measurement system based on the pulsed laser beam, and measuring a phase shift of an interference image; calculating a distribution of electron areal densities based on the phase shift in the interference image; obtaining a two-dimensional distribution of an average magnetic field based on the rotation angles and the electron areal densities.