The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Apr. 29, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Hsinchu, TW;

Inventors:

Ping-Hsun Lin, New Taipei, TW;

Hung-Yi Tsai, Zhubei, TW;

Hao-Ping Cheng, Taichung, TW;

Ta-Cheng Lien, Cyonglin, TW;

Hsin-Chang Lee, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01J 37/22 (2006.01); H01J 37/32 (2006.01); H01L 21/308 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); H01J 37/22 (2013.01); H01J 37/3244 (2013.01); H01J 37/32477 (2013.01); H01J 37/32568 (2013.01); H01L 21/308 (2013.01); H05H 1/24 (2013.01); H01J 37/32082 (2013.01); H01J 2237/334 (2013.01); H05H 2245/40 (2021.05);
Abstract

Methods for plasma stability in a plasma treatment tool are disclosed. A laser is positioned within a plasma treatment chamber within a skin depth of the electromagnetic field generated therein. The laser can be synchronized with the electrical triggering signals that generate the electromagnetic field. This scheme provides a stable and efficient method of plasma ignition.


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