logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12394602 B1

PDFFull Text
Date of Patent:
Aug. 19, 2025

Filed:

Jul. 24, 2020

Wafer processing method

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chien Kuo Huang, Hsinchu, TW;

Shih-Wen Huang, Tainan, TW;

Joung-Wei Liou, Zhudong Town, TW;

Chia-I Shen, Hsinchu, TW;

Fei-Fan Chen, Hsinchu, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;

Attorney:

Hauptman Ham, LLP

Primary Examiner:

Michael P Rodriguez

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/452 (2013.01); C23C 16/45565 (2013.01); C23C 16/52 (2013.01); H01J 37/3244 (2013.01); H01L 21/67051 (2013.01); H01L 21/6708 (2013.01);
Abstract

A method of wafer processing includes supporting a wafer in a process chamber. The method further includes introducing a flow of a gaseous material through an inlet of the process chamber to process the wafer. The method further includes generating, between the inlet and the wafer, controllable forces acting in various directions on the gaseous material to spread the gaseous material inside the process chamber.

Find Patent Forward Citations

Huang, Chien. (2025). Wafer processing method (U.S. Patent No. 12394602). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12394602

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…