The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Aug. 11, 2022
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruilong Xie, Niskayuna, NY (US);

Nicholas Anthony Lanzillo, Wynantskill, NY (US);

Albert M. Chu, Nashua, NH (US);

Daniel James Dechene, Colonie, NY (US);

Eric Miller, Watervliet, NY (US);

Lawrence A. Clevenger, Saratoga Springs, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H10D 30/67 (2025.01); H10D 62/13 (2025.01); H10D 84/85 (2025.01);
U.S. Cl.
CPC ...
H10D 62/121 (2025.01); H10D 30/6757 (2025.01); H10D 62/151 (2025.01); H10D 84/856 (2025.01);
Abstract

Embodiments of the invention include a first source region and a first drain region forming a first L-shaped layout. The first source and drain regions are formed on a bottom gate spacer material. Embodiments include a second source region and a second drain region forming a second L-shaped layout, the first L-shaped layout and the second L-shaped layout being interrupted by a gate. One of the first source and drain regions extends in a direction beyond the bottom gate spacer material to form the first L-shaped layout, wherein the direction is parallel to a lengthwise direction of the gate.


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