The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
May. 16, 2022
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A semiconductor device structure and a formation method are provided. The method includes forming a first fin structure, a second fin structure, a third fin structure, and a fourth fin structure over a substrate. The second fin structure is between the first fin structure and the third fin structure, and the third fin structure is between the second fin structure and the fourth fin structure. A first lateral distance between the first and the second fin structures is greater than a second lateral distance between the third and the fourth fin structures. The method also includes forming a first p-type epitaxial structure over the first fin structure and forming a second p-type epitaxial structure over the second fin structure. The method further includes forming a first n-type epitaxial structure over the third fin structure and forming a second n-type epitaxial structure over the fourth fin structure.