The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Aug. 13, 2021
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Nicole K. Thomas, Portland, OR (US);

Samuel Bader, Hillsboro, OR (US);

Marko Radosavljevic, Portland, OR (US);

Han Wui Then, Portland, OR (US);

Pratik Koirala, Portland, OR (US);

Nityan Nair, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/06 (2006.01); H01L 21/02 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H01L 29/775 (2006.01); H01L 29/778 (2006.01); H01L 29/786 (2006.01); H10D 30/43 (2025.01); H10D 30/47 (2025.01); H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 62/85 (2025.01); H10D 64/00 (2025.01); H10D 84/01 (2025.01);
U.S. Cl.
CPC ...
H10D 84/01 (2025.01); H01L 21/02381 (2013.01); H01L 21/0243 (2013.01); H01L 21/0254 (2013.01); H10D 30/43 (2025.01); H10D 30/475 (2025.01); H10D 30/6735 (2025.01); H10D 30/6743 (2025.01); H10D 30/6757 (2025.01); H10D 62/121 (2025.01); H10D 62/8503 (2025.01); H10D 64/111 (2025.01);
Abstract

Gallium nitride (GaN) integrated circuit technology is described. In an example, an integrated circuit structure includes a substrate including silicon, the substrate having a top surface. A first trench is in the substrate, the first trench having a first width. A second trench is in the substrate, the second trench having a second width less than the first width. A first island is in the first trench, the first island including gallium and nitrogen and having first corner facets below the top surface of the substrate. A second island is in the second trench, the second island including gallium and nitrogen and having second corner facets below the top surface of the substrate.


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