The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Nov. 21, 2022
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Vibhor Jain, Essex Junction, VT (US);

Jeffrey Johnson, Essex Junction, VT (US);

Viorel Ontalus, Unionville, CT (US);

John J. Pekarik, Underhill, VT (US);

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 10/80 (2025.01); H10D 10/01 (2025.01); H10D 62/13 (2025.01);
U.S. Cl.
CPC ...
H10D 10/891 (2025.01); H10D 10/021 (2025.01); H10D 62/136 (2025.01);
Abstract

Structures for a heterojunction bipolar transistor and methods of forming a structure for a heterojunction bipolar transistor. The structure comprises an emitter, a collector including a first section, a second section, and a third section positioned in a first direction between the first section and the second section, and an intrinsic base disposed in a second direction between the emitter and the third section of the collector. The structure further comprises a stress layer including a section positioned to overlap with the emitter, the intrinsic base, and the collector. The section of the stress layer is surrounded by a perimeter, and the first and second sections of the collector are each positioned adjacent to the perimeter of the stress layer.


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