The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Feb. 19, 2021
Applicants:

Nippon Micrometal Corporation, Saitama, JP;

Nippon Steel Chemical & Material Co., Ltd., Tokyo, JP;

Inventors:

Tomohiro Uno, Tokyo, JP;

Tetsuya Oyamada, Tokyo, JP;

Daizo Oda, Saitama, JP;

Kota Shimomura, Saitama, JP;

Tadashi Yamaguchi, Saitama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); G01N 23/2273 (2018.01);
U.S. Cl.
CPC ...
H01L 24/45 (2013.01); G01N 23/2273 (2013.01); H01L 2224/45005 (2013.01); H01L 2224/45139 (2013.01); H01L 2224/45147 (2013.01); H01L 2224/45164 (2013.01); H01L 2224/45169 (2013.01); H01L 2224/45173 (2013.01); H01L 2224/45187 (2013.01); H01L 2924/37002 (2013.01);
Abstract

There is provided a copper bonding wire that exhibits a favorable bondability even when a scrub at the time of bonding is reduced. The copper bonding wire is characterized in that when a sum of percentages of Cu, CuO, CuO and Cu(OH)on a surface of the wire as measured by X-ray Photoelectron Spectroscopy (XPS) is defined as 100%, Cu[II]/Cu[I] which is a ratio of a total percentage of CuO and Cu(OH)(Cu[II]) corresponding to bivalent Cu to a percentage of CuO (Cu[I]) corresponding to monovalent Cu falls within a range from 0.8 to 12.


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