The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Dec. 07, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Injo Ok, Loudonville, NY (US);

Soon-Cheon Seo, Glenmont, NY (US);

Alexander Reznicek, Troy, NY (US);

Youngseok Kim, Upper Saddle River, NJ (US);

Timothy Mathew Philip, Albany, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 70/20 (2023.01); H10N 70/00 (2023.01);
U.S. Cl.
CPC ...
H10N 70/231 (2023.02); H10N 70/011 (2023.02); H10N 70/826 (2023.02); H10N 70/8616 (2023.02);
Abstract

A semiconductor device includes a PCM stack that includes bottom electrode liner over a lower heater. The bottom electrode liner has a top-down view plus (+) geometry with a 'horizontal' portion being orthogonal to a ‘vertical’ portion. An airgap is formed within the PCM stack in an area located adjacent and between the ‘horizontal’ portion and the ‘vertical’ portion. The airgap has a substantially smaller dielectric constant than the surrounding PCM stack material(s). Therefore, the airgap may effectively reduce the amount of current that leaks from the PCM stack when flowing from the bottom electrode liner to a top contact or top electrode. Further, the airgap may allow for expansion of the surrounding PCM stack material(s) that may result from the heating of the PCM stack.


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