The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Sep. 12, 2022
Applicant:

Shanghai Huahong Grace Semiconductor Manufacturing Corporation, Shanghai, CN;

Inventors:

Jia Pan, Shanghai, CN;

Tongbo Zhang, Shanghai, CN;

Yiping Yao, Shanghai, CN;

Jiye Yang, Shanghai, CN;

Junjun Xing, Shanghai, CN;

Chong Chen, Shanghai, CN;

Xuan Huang, Shanghai, CN;

Peng Sun, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H01L 21/265 (2006.01); H10D 12/00 (2025.01); H10D 12/01 (2025.01); H10D 62/17 (2025.01);
U.S. Cl.
CPC ...
H10D 62/111 (2025.01); H01L 21/26513 (2013.01); H10D 12/038 (2025.01); H10D 12/481 (2025.01); H10D 62/393 (2025.01);
Abstract

An IGBT device and a method for manufacturing it, the device includes a super junction structure that has several N-type pillars and P-type pillars arranged alternately; a cell unit that is located in an N-type epitaxial layer, and the N-type epitaxial layer is located above the N-type substrate; each cell unit includes a trench gate, a P-type body region, and a source region; an N-type carrier injection layer, the N-type carrier injection layer is located in the N-type epitaxial layer, and the N-type carrier injection layer is spaced apart from the N-type substrate by the N-type epitaxial layer; the bottom of the P-type body region is located in the N-type carrier injection layer; and a collector region that is located at the bottom of the N-type substrate.


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