The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Nov. 14, 2023
Stmicroelectronics S.r.l., Agrate Brianza, IT;
Edoardo Zanetti, Valverde, IT;
Simone Rascuna', Catania, IT;
Mario Giuseppe Saggio, Aci Bonaccorsi, IT;
Alfio Guarnera, Trecastagni, IT;
Leonardo Fragapane, Catania, IT;
Cristina Tringali, Augusta, IT;
STMICROELECTRONICS S.r.l., Agrate Brianza, IT;
Abstract
A manufacturing method of an electronic device includes: forming a drift layer of an N type; forming a trench in the drift layer; forming an edge-termination structure alongside the trench by implanting dopant species of a P type; and forming a depression region between the trench and the edge-termination structure by digging the drift layer. The steps of forming the depression region and the trench are carried out at the same time. The step of forming the depression region comprises patterning the drift layer to form a structural connection with the edge-termination structure having a first slope, and the step of forming the trench comprises etching the drift layer to define side walls of the trench, which have a second slope steeper than the first slope.