The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Feb. 12, 2024
Beijing E-town Semiconductor Technology Co., Ltd., Beijing, CN;
Mattson Technology, Inc., Fremont, CA (US);
Dieter Hezler, Lonsee-Halzhausen, DE;
Keli Huang, Wuhan, CN;
Jianmin Ji, Beijing, CN;
Deqiang Zeng, Shanghai, CN;
Manuel Sohn, Neu-Ulm, DE;
Beijing E-Town Semiconductor Technology Co., Ltd., Beijing, CN;
Mattson Technology, Inc., Fremont, CA (US);
Abstract
A processing apparatus for processing a workpiece is presented. The processing apparatus includes a processing chamber, a plasma chamber separated from the processing chamber disposed on a first side of the processing chamber, and a plasma source configured to generate a plasma in the plasma chamber. One or more radiative heat sources configured to heat the workpiece disposed on a second and opposite side of the first side of the processing chamber. A dielectric window is disposed between the workpiece support and the one or more heat sources. The processing apparatus includes a rotation system configured to rotate the workpiece, the rotation system comprising a magnetic actuator.