The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Apr. 26, 2022
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Hans Michael Stiepan, Aalen, DE;
Thomas Korb, Schwaebisch Gmuend, DE;
Eugen Foca, Ellwangen, DE;
Alex Buxbaum, San Ramon, CA (US);
Dmitry Klochkov, Schwaebisch Gmuend, DE;
Jens Timo Neumann, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
Semiconductor structures can be investigated, e.g., in an in-line quality check. An x-ray scattering measurement, e.g., CD-SAXS, can be used for wafer metrology. The x-ray scattering measurement can be configured based on a slice-and-imaging tomographic measurement using a dual-beam device, e.g., including a focused ion beam device and a scanning electron microscope.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile