The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Feb. 26, 2021
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Ming-Yi Shen, Hsinchu, TW;
Hsin-Lin Wu, Hsinchu, TW;
Yao-Fong Dai, Hsinchu, TW;
Pei-Yuan Tai, Hsinchu, TW;
Chin-Wei Chen, Hsinchu, TW;
Yin-Tun Chou, Hsinchu, TW;
Yuan-Hsin Chi, Hsinchu, TW;
Sheng-Yuan Lin, Hsinchu, TW;
Taiwan Semiconductor Manufacturing CO., Ltd., Hsinchu, TW;
Abstract
The present disclosure relates to exclusion rings for use in processing a semiconductor substrate in a processing chamber, such as a chemical vapor deposition chamber. The exclusion ring includes an alignment structure that cooperates with an alignment structure on a platen on which the exclusion ring will rest during processing of the wafer. The first alignment structure includes a guiding surface which promotes the reception of and positioning of the second alignment structure within the first alignment structure. Methods of utilizing the described exclusion rings are also described.