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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12266579 B1

PDFFull Text
Date of Patent:
Apr. 01, 2025

Filed:

Aug. 30, 2021

Method and system for adjusting the gap between a wafer and a top plate in a thin-film deposition process

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Sheng-Chan Li, Hsinchu, TW;

Sheng-Chau Chen, Hsinchu, TW;

Cheng-Hsien Chou, Hsinchu, TW;

Cheng-Yuan Tsai, Hsinchu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Attorney:

Seed IP Law Group

Primary Examiner:

Edward Chin

Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/46 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/32724 (2013.01); H01J 37/32944 (2013.01); H01L 21/02274 (2013.01); H01J 2237/3321 (2013.01);
Abstract

A thin-film deposition system includes a top plate positioned above a wafer and configured to generate a plasma during a thin-film deposition process. The system includes a gap sensor configured to generate sensor signals indicative of a gap between the wafer and the top plate. The system includes a control system configured to adjust the gap during the thin-film deposition process responsive to the sensor signals.

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Quick Actions:

Li, Sheng-Chan. (2025). Method and system for adjusting the gap between a wafer and a top plate in a thin-film deposition process (U.S. Patent No. 12266579). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12266579

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