The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Nov. 13, 2023
Applicant:

Yangtze Memory Technologies Co., Ltd., Hubei, CN;

Inventors:

Yali Song, Hubei, CN;

Li Hong Xiao, Hubei, CN;

Ming Wang, Hubei, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); G11C 16/04 (2006.01); G11C 16/14 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 23/528 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H10B 43/10 (2023.01); H10B 43/35 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); G11C 16/0483 (2013.01); G11C 16/14 (2013.01); H01L 21/31116 (2013.01); H01L 23/528 (2013.01); H01L 29/0847 (2013.01); H01L 29/1037 (2013.01); H10B 43/10 (2023.02); H10B 43/35 (2023.02); H01L 21/0276 (2013.01); H01L 21/31144 (2013.01);
Abstract

A 3D-NAND memory device is provided. The memory device includes a substrate, a bottom select gate (BSG) disposed over the substrate, a plurality of word lines positioned over the BSG with a staircase configuration and a plurality of insulating layers disposed between the substrate, the BSG, and the plurality of word lines. In the disclosed memory device, one or more first dielectric trenches are formed in the BSG and extend in a length direction of the substrate to separate the BSG into a plurality of sub-BSGs. In addition, one or more common source regions are formed over the substrate and extend in the length direction of the substrate. The one or more common source regions further extend through the BSG, the plurality of word lines and the plurality of insulating layers.


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