The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Jan. 31, 2023
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Brian Giera, Oakland, CA (US);
Adam Jaycox, Broomfield, CA (US);
Brian Au, El Mont, CA (US);
Alex Caviness, Oakland, CA (US);
Alexander Blum, Livermore, CA (US);
Nishant Ojal, Livermore, CA (US);
LAWRENCE LIVERMORE NATIONAL SECURITY, LLC, Livermore, CA (US);
Abstract
A method is disclosed for selecting an optimal value for an adjustable parameter of a structured light metrology (SLM) system, for scanning an object. The SLM system performs test scans of the object to acquire a plurality of sets of measurements of the object, wherein a different value is used for the parameter for each test scan. For each test scan, a value of a quality metric is calculated, based on the set of measurements of the object associated with the test scan and simulation data representing a simulated scan of the object by the SLM system. A test scan is then identified that has a quality metric value that satisfies a specified optimization criterion; and a value of the adjustable parameter that was used for the identified test scan is selected as the optimal value of the adjustable parameter, for scanning the object.