The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Mar. 22, 2022
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Yuichi Harada, Matsumoto, JP;

Seiji Noguchi, Matsumoto, JP;

Norihiro Komiyama, Matsumoto, JP;

Yoshihiro Ikura, Matsumoto, JP;

Yosuke Sakurai, Azumino, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4236 (2013.01); H01L 29/0696 (2013.01); H01L 29/0804 (2013.01); H01L 29/41708 (2013.01); H01L 29/66348 (2013.01); H01L 29/7397 (2013.01);
Abstract

There is provided a semiconductor device including: a drift region of a first conductivity type disposed in a semiconductor substrate; a base region of a second conductivity type disposed above the drift region; an emitter region of the first conductivity type disposed above the base region; a plurality of trench portions arrayed in a predetermined array direction on a front surface side of the semiconductor substrate; a trench contact disposed on the front surface side of the semiconductor substrate between two adjacent trench portions; and a contact layer of the second conductivity type disposed under the trench contact and having a higher doping concentration than the base region, wherein a lower end of the trench contact is deeper than a lower end of the emitter region, and the emitter region and the contact layer are in contact with each other at a side wall of the trench contact.


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