The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2024
Filed:
Feb. 17, 2022
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Min-Yeong Moon, Ann Arbor, MI (US);
Stilian Pandev, Santa Clara, CA (US);
Dimitry Sanko, Vallejo, CA (US);
Assignee:
KLA CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G03F 7/00 (2006.01); G06N 3/0464 (2023.01); G06N 3/09 (2023.01); G06N 5/022 (2023.01); G06N 20/00 (2019.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 11/24 (2013.01); G03F 7/706841 (2023.05); G06N 3/09 (2023.01); G06N 5/022 (2013.01); G06N 20/00 (2019.01); H01L 22/12 (2013.01); G03F 7/70633 (2013.01); G06N 3/0464 (2023.01);
Abstract
A metrology module includes an estimation model that is configured to provide an estimation of independent overlay with tool induced shift on received wafers based on only one azimuth angle spectra. The estimation model can use at least one machine learning algorithm. The estimation model can be derived by the machine learning algorithm applied to calculated training data based on a first training sample set from initial metrology measurements and an additional tool induced shift training sample.