The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2024
Filed:
Dec. 23, 2020
Rigaku Corporation, Akishima, JP;
Tomoyuki Iwata, Akishima, JP;
Kazuhiko Omote, Akishima, JP;
Kazuki Ito, Akishima, JP;
Tetsuya Ozawa, Akishima, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
Provided is a scattering measurement analysis method including obtaining a theoretical scattering intensity from a structural model that contains a lot of scatterers, wherein the obtaining of a theoretical scattering intensity includes obtaining a contribution to the theoretical scattering intensity of a pair of a scatterer 'm' and a scatterer “n” existing at a distance “r” from the scatterer “m” among a plurality of scatterers by at least one of calculations in accordance with the distance “r”, the calculations including a first calculation of calculating contributions of the scatterer “m” and the scatterer “n” from respective scattering factors f(q) and f*(q) and a center-to-center distance rbetween the scatterer “m” and the scatterer “n”, and a second calculation of substituting the scattering factor f*(q) of the scatterer “n” by a first representative value and substituting a probability density function of the number of scatterers existing at the distance “r” by a constant value.