The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
Aug. 18, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
Chawon Koh, Yongin-si, KR;
Soyeon Yoo, Hwaseong-si, KR;
Sooyoung Choi, Hwaseong-si, KR;
Tsunehiro Nishi, Seongnam-si, KR;
Kwangsub Yoon, Yongin-si, KR;
Brian Cardineau, Corvallis, OR (US);
Kumagai Tomoya, Kanagawa, JP;
Samsung Electronics Co., Ltd., , KR;
Inpria Corporation, Corvallis, OR (US);
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
In a method of manufacturing an integrated circuit device, a photoresist layer is formed by coating a photoresist composition on a substrate having a main surface and an edge portion surrounding the main surface. A portion of the photoresist layer is removed from the edge portion of the substrate. After the portion of the photoresist layer is removed, the substrate is processed using a main treatment composition including an organic solvent, acid, and water.