The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Aug. 10, 2022
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Tsmc China Company, Limited, Shanghai, CN;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
TSMC CHINA COMPANY, LIMITED, Shanghai, CN;
Abstract
A method of making an integrated circuit includes operations related to forming an oxide layer over a top surface of a substrate; depositing a layer of semiconductor material over the oxide layer; and manufacturing a thermal substrate contact extending through the layer of semiconductor material and the oxide layer to the top surface of the substrate. The thermal substrate contact is against, but does not extend through, the substrate. Manufacturing a thermal substrate contact further includes operations of etching a first opening through the layer of semiconductor material to expose the oxide layer; etching a second opening through the first opening to expose the substrate; and filling the first opening and the second opening with a conductive material.