The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Jul. 03, 2023
Applicant:
Globalwafers Co., Ltd., Hsinchu, TW;
Inventors:
Assignee:
GLOBALWAFERS CO., LTD., Hsinchu, TW;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 45/16 (2006.01); B01D 53/14 (2006.01); B01D 53/46 (2006.01); B01D 53/76 (2006.01); B04C 5/185 (2006.01); B04C 9/00 (2006.01); C30B 35/00 (2006.01);
U.S. Cl.
CPC ...
B01D 45/16 (2013.01); B01D 53/145 (2013.01); B01D 53/46 (2013.01); B01D 53/76 (2013.01); B04C 5/185 (2013.01); B04C 9/00 (2013.01); C30B 35/00 (2013.01); B01D 2252/103 (2013.01); B04C 2009/005 (2013.01);
Abstract
A method for collecting dust from a single crystal growth system includes providing dry air and oxygen into an exit pipe connecting to the single crystal growth system, blowing a first inert gas into the exit pipe to compel the dust oxide toward a dust collecting device, collecting the dust oxide by the dust collecting device; and providing a rotary pump to transport residues of the dust oxide backward. The oxygen reacts with the unstable dust for forming dust oxide. The exit pipe is used to exhaust unstable dust from the single crystal growth system.